Aluminum Diboride Sputtering Target

Aluminum Diboride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Aluminum Diboride Sputtering Target	Circular	99.5% - 99.99%	0 - 48	≥ 1
Aluminum Diboride Sputtering Target	Rectangular	99.5% - 99.99%	0 - 48	≥ 1
Aluminum Diboride Sputtering Target	Annular	99.5% - 99.99%	0 - 48	≥ 1
Aluminum Diboride Sputtering Target	Oval	99.5% - 99.99%	0 - 48	≥ 1
Aluminum Diboride Sputtering Target	Cylindrical	99.5% - 99.99%	0 - 48	≥ 1
Aluminum Diboride Sputtering Target	Planar	99.5% - 99.99%	0 - 48	≥ 1
Aluminum Diboride Sputtering Target	Rotatable (rotary)	99.5% - 99.99%	0 - 48	≥ 1

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Aluminum diboride is a binary compound formed by aluminum and boron. It is a red solid at normal temperature and pressure. The chemical formula is AlB2. The molecular weight is 48.604. The density is 3.19 g/cm3. The melting point is 1655 °C。 Aluminum diboride is prepared by heating reaction after mixing fine powder of aluminum and boron.

Aluminum diboride sputtering target is a kind of high purity aluminum diboride raw material by sputtering deposition. According to the different shapes, aluminum diboride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) aluminum diboride targets. 

Aluminum Diboride Sputtering Target Application

High purity aluminum diboride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.