Chromium Disilicide Sputtering Target

Chromium Disilicide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Chromium Disilicide Sputtering Target	Circular	99.5% - 99.95%	0 - 48	≥ 1
Chromium Disilicide Sputtering Target	Rectangular	99.5% - 99.95%	0 - 48	≥ 1
Chromium Disilicide Sputtering Target	Annular	99.5% - 99.95%	0 - 48	≥ 1
Chromium Disilicide Sputtering Target	Oval	99.5% - 99.95%	0 - 48	≥ 1
Chromium Disilicide Sputtering Target	Cylindrical	99.5% - 99.95%	0 - 48	≥ 1
Chromium Disilicide Sputtering Target	Planar	99.5% - 99.95%	0 - 48	≥ 1
Chromium Disilicide Sputtering Target	Rotatable (rotary)	99.5% - 99.95%	0 - 48	≥ 1

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Chromium disilicide is a kind of silicide with gray tetragonal prismatic crystal appearance. The chemical formula is CrSi2. The density is 4.39 g/cm3. The melting point is 1470 ℃. Chromium disilicide is insoluble in water, but soluble in hydrochloric acid and hydrofluoric acid. Chromium disilicide film has high resistivity and low temperature coefficient of resistance.

Chromium disilicide sputtering target is a kind of high purity chromium disilicide raw material by sputtering deposition. According to the different shapes, chromium disilicide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) chromium disilicide targets. 

Chromium Disilicide Sputtering Target Application

Chromium disilicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.