Chromium Oxide Sputtering Target

Chromium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Chromium Oxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Chromium Oxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Chromium Oxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Chromium Oxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Chromium Oxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Chromium Oxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Chromium Oxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Chromium oxide is light green to dark green, small hexagonal crystal in appearance. The chemical formula is Cr2O3. The melting point is 2266 ℃. The boiling point is 4000 ℃. Chromic oxide turns brown when it is hot and still green after cooling. Chromium oxide is soluble in heated potassium bromate solution, slightly soluble in acids and alkalis, almost insoluble in water, ethanol and acetone.

Chromium oxide sputtering target is a kind of high purity chromium oxide raw material by sputtering deposition. According to the different shapes, chromium oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) chromium oxide targets. Chromium oxide can be used in pigment, metallurgy, catalyst and other occasions.

Chromium Oxide Sputtering Target Application

High purity chromium oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Non-volatile Memory;
- Thin film capacitor;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.