Hafnium Carbide Sputtering Target

Hafnium Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Hafnium Carbide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Carbide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Carbide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Carbide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Carbide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Carbide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Carbide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Hafnium carbide is a kind of black carbide in appearance. The chemical formula is HfC. The density is 12.2g/cm3 and the melting point is 3900 ℃. The coefficient of thermal expansion is 6.73 × 10-6 / ℃.

Hafnium carbide sputtering target is a kind of high purity hafnium carbide raw material by sputtering deposition. According to the different shapes, hafnium carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) hafnium carbide targets. Hafnium carbide has the characteristics of high melting point, high elastic coefficient, good electrothermal conductivity, small thermal expansion and good impact performance. It can be used in rocket nozzle, nose cone of re-entry space rocket and ceramic industry.

Hafnium Carbide Sputtering Target Application

Hafnium carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.