Hafnium Sputtering Target

Hafnium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Hafnium Sputtering Target	Circular	99.9% - 99.95%	0 - 48	≥ 1
Hafnium Sputtering Target	Rectangular	99.9% - 99.95%	0 - 48	≥ 1
Hafnium Sputtering Target	Annular	99.9% - 99.95%	0 - 48	≥ 1
Hafnium Sputtering Target	Oval	99.9% - 99.95%	0 - 48	≥ 1
Hafnium Sputtering Target	Cylindrical	99.9% - 99.95%	0 - 48	≥ 1
Hafnium Sputtering Target	Planar	99.9% - 99.95%	0 - 48	≥ 1
Hafnium Sputtering Target	Rotatable (rotary)	99.9% - 99.95%	0 - 48	≥ 1

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Hafnium is a silver gray transition metal with luster. The element symbol is Hf. The atomic number is 72 and the atomic weight is 178.49. Hafnium does not react with dilute hydrochloric acid, dilute sulfuric acid and strong alkali solution, but is soluble in hydrofluoric acid and aqua regia.

Hafnium sputtering target is a kind of high purity hafnium raw material by sputtering deposition. According to the different shapes, hafnium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) hafnium targets. Hafnium can be used as filament of incandescent lamp, cathode of X-ray tube, electrode of high voltage discharge tube, cathode of X-ray and tungsten wire manufacturing industry. Pure hafnium is an important material in atomic energy industry because of its plasticity, easy processing, high temperature resistance and corrosion resistance. Hafnium is an ideal neutron absorber and can be used as control rod and protection device of atomic reactor.

Hafnium Sputtering Target Application

High purity hafnium sputtering target can be used in many applications. The details are as follows:
- Electronics;
- Semiconductor;
- Flat panel displays.