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High Purity Aluminum Oxide Sputtering Target

High Purity Aluminum Oxide Sputtering Target

AvailableHigh Purity Aluminum Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Al2O3
  • Purity: 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Aluminum Oxide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Aluminum Oxide Sputtering Target Circular 99.99% 0 - 48 ≥ 1
    High Purity Aluminum Oxide Sputtering Target Rectangular 99.99% 0 - 48 ≥ 1
    High Purity Aluminum Oxide Sputtering Target Annular 99.99% 0 - 48 ≥ 1
    High Purity Aluminum Oxide Sputtering Target Oval 99.99% 0 - 48 ≥ 1
    High Purity Aluminum Oxide Sputtering Target Cylindrical 99.99% 0 - 48 ≥ 1
    High Purity Aluminum Oxide Sputtering Target Planar 99.99% 0 - 48 ≥ 1
    High Purity Aluminum Oxide Sputtering Target Rotatable (rotary) 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity aluminum oxide sputtering target refers to the high purity aluminum oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity aluminum oxide sputtering targets.

    High Purity Aluminum Oxide Sputtering Target Application

    High purity aluminum oxide sputtering target can be used in microelectronics, display, storage and other fields. The details are as follows:
    - Aerospace;
    - Automobile;
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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