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High Purity Cerium Oxide Sputtering Target

High Purity Cerium Oxide Sputtering Target

AvailableHigh Purity Cerium Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: CeO2
  • Purity: 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Cerium Oxide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Cerium Oxide Sputtering Target Circular 99.99% 0 - 48 ≥ 1
    High Purity Cerium Oxide Sputtering Target Rectangular 99.99% 0 - 48 ≥ 1
    High Purity Cerium Oxide Sputtering Target Annular 99.99% 0 - 48 ≥ 1
    High Purity Cerium Oxide Sputtering Target Oval 99.99% 0 - 48 ≥ 1
    High Purity Cerium Oxide Sputtering Target Cylindrical 99.99% 0 - 48 ≥ 1
    High Purity Cerium Oxide Sputtering Target Planar 99.99% 0 - 48 ≥ 1
    High Purity Cerium Oxide Sputtering Target Rotatable (rotary) 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity cerium oxide sputtering target refers to the high purity cerium oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity ceria sputtering target.

    High Purity Cerium Oxide Sputtering Target Application

    High purity cerium oxide sputtering target can be used in many applications. The details are as follows:
    - Ferroelectric;
    - Gate Dielectric;
    - For CMOS;
    - Non-volatile Memory;
    - Thin film capacitor;
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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