High Purity Copper Sputtering Target

High Purity Copper Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Copper Sputtering Target	Circular	99.99% - 99.9999%	0 - 48	≥ 1
High Purity Copper Sputtering Target	Rectangular	99.99% - 99.9999%	0 - 48	≥ 1
High Purity Copper Sputtering Target	Annular	99.99% - 99.9999%	0 - 48	≥ 1
High Purity Copper Sputtering Target	Oval	99.99% - 99.9999%	0 - 48	≥ 1
High Purity Copper Sputtering Target	Cylindrical	99.99% - 99.9999%	0 - 48	≥ 1
High Purity Copper Sputtering Target	Planar	99.99% - 99.9999%	0 - 48	≥ 1
High Purity Copper Sputtering Target	Rotatable (rotary)	99.99% - 99.9999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity copper sputtering target refers to the high purity copper sputtering target with purity over 99%. We mainly provide 4N (99.99%), 5N (99.999%) and 6N (99.9999%) high-purity copper sputtering targets.

High Purity Copper Sputtering Target Application

Copper sputtering target can be used in many occasions. The details are as follows:
- Display and touch screen wiring and its protective film;
- Solar light absorption layer;
- Semiconductor wiring;
- Touch screen industry;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.