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High Purity Hafnium Sputtering Target

High Purity Hafnium Sputtering Target

AvailableHigh Purity Hafnium Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Hf
  • Purity: 99.9% - 99.95%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Hafnium Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Hafnium Sputtering Target Circular 99.9% - 99.95% 0 - 48 ≥ 1
    High Purity Hafnium Sputtering Target Rectangular 99.9% - 99.95% 0 - 48 ≥ 1
    High Purity Hafnium Sputtering Target Annular 99.9% - 99.95% 0 - 48 ≥ 1
    High Purity Hafnium Sputtering Target Oval 99.9% - 99.95% 0 - 48 ≥ 1
    High Purity Hafnium Sputtering Target Cylindrical 99.9% - 99.95% 0 - 48 ≥ 1
    High Purity Hafnium Sputtering Target Planar 99.9% - 99.95% 0 - 48 ≥ 1
    High Purity Hafnium Sputtering Target Rotatable (rotary) 99.9% - 99.95% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity hafnium sputtering target refers to the high purity hafnium sputtering target with purity over 99%. We mainly provide 3N (99.9%) and 3N5 (99.95%) hafnium sputtering targets.

    High Purity Hafnium Sputtering Target Application

    High purity hafnium sputtering target can be used in many applications. The details are as follows:
    - Electronics;
    - Semiconductor;
    - Flat panel displays.
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    Room 1842, Block B, No.858 Dujuan Road, Yuelu District, Changsha, Hunan 410205, China
    Tel.: 86 731 8974 7657           Email: sales@fushel.com
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