High Purity IZO Sputtering Target

High Purity IZO Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity IZO Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
High Purity IZO Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
High Purity IZO Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
High Purity IZO Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
High Purity IZO Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
High Purity IZO Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
High Purity IZO Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity IZO sputtering target refers to the high purity IZO sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity IZO sputtering target.

High Purity IZO Sputtering Target Application

High purity IZO sputtering target can be used in many occasions. The details are as follows:
- Transparent conductive film;
- Physical vapor deposition;
- Chemical vapor deposition.