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High Purity Magnesium Silicide Sputtering Target

High Purity Magnesium Silicide Sputtering Target

AvailableHigh Purity Magnesium Silicide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Mg2Si
  • Purity: 99.5% - 99.9%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Magnesium Silicide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Magnesium Silicide Sputtering Target Circular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Magnesium Silicide Sputtering Target Rectangular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Magnesium Silicide Sputtering Target Annular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Magnesium Silicide Sputtering Target Oval 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Magnesium Silicide Sputtering Target Cylindrical 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Magnesium Silicide Sputtering Target Planar 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Magnesium Silicide Sputtering Target Rotatable (rotary) 99.5% - 99.9% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity magnesium silicide sputtering target refers to the high purity magnesium silicide sputtering target with purity over 99%. We mainly provide 2N5 (99.5%) high-purity magnesium silicide sputtering targets.

    High Purity Magnesium Silicide Sputtering Target Application

    High purity magnesium silicide sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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