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High Purity Tantalum Disilicide Sputtering Target

High Purity Tantalum Disilicide Sputtering Target

AvailableHigh PurityTantalum Disilicide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: TaSi2
  • Purity: 99.95% - 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High PurityTantalum Disilicide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High PurityTantalum Disilicide Sputtering Target Circular 99.95% - 99.99% 0 - 48 ≥ 1
    High PurityTantalum Disilicide Sputtering Target Rectangular 99.95% - 99.99% 0 - 48 ≥ 1
    High PurityTantalum Disilicide Sputtering Target Annular 99.95% - 99.99% 0 - 48 ≥ 1
    High PurityTantalum Disilicide Sputtering Target Oval 99.95% - 99.99% 0 - 48 ≥ 1
    High PurityTantalum Disilicide Sputtering Target Cylindrical 99.95% - 99.99% 0 - 48 ≥ 1
    High PurityTantalum Disilicide Sputtering Target Planar 99.95% - 99.99% 0 - 48 ≥ 1
    High PurityTantalum Disilicide Sputtering Target Rotatable (rotary) 99.95% - 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity tantalum disilicide sputtering target refers to the high purity tantalum disilicide sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) high-purity tantalum disilicide sputtering targets.

    High PurityTantalum Disilicide Sputtering Target Application

    High purity tantalum disilicide sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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