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High Purity Tungsten Sputtering Target

High Purity Tungsten Sputtering Target

AvailableHigh Purity Tungsten Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: W
  • Purity: 99.95% - 99.999%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Tungsten Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Tungsten Sputtering Target Circular 99.95% - 99.999% 0 - 48 ≥ 1
    High Purity Tungsten Sputtering Target Rectangular 99.95% - 99.999% 0 - 48 ≥ 1
    High Purity Tungsten Sputtering Target Annular 99.95% - 99.999% 0 - 48 ≥ 1
    High Purity Tungsten Sputtering Target Oval 99.95% - 99.999% 0 - 48 ≥ 1
    High Purity Tungsten Sputtering Target Cylindrical 99.95% - 99.999% 0 - 48 ≥ 1
    High Purity Tungsten Sputtering Target Planar 99.95% - 99.999% 0 - 48 ≥ 1
    High Purity Tungsten Sputtering Target Rotatable (rotary) 99.95% - 99.999% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity tungsten sputtering target refers to the high purity tungsten sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) tungsten sputtering target, 4N (99.99%) tungsten sputtering target, 5N (99.999%) tungsten sputtering target and 8N (99.999999%) tungsten sputtering target.

    High Purity Tungsten Sputtering Target Application

    High purity tungsten sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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