High Purity Tungsten Trioxide Sputtering Target

High Purity Tungsten Trioxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Tungsten Trioxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Tungsten Trioxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Tungsten Trioxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Tungsten Trioxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
High Purity Tungsten Trioxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
High Purity Tungsten Trioxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
High Purity Tungsten Trioxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity tungsten trioxide sputtering target refers to the high purity tungsten trioxide sputtering target with purity over 99%. We mainly provide 3N (99.9%) high-purity tungsten trioxide sputtering target.

High Purity Tungsten Trioxide Sputtering Target Application

High purity tungsten trioxide sputtering targets can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.