High Purity Vanadium Sputtering Target

High Purity Vanadium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Vanadium Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Vanadium Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Vanadium Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Vanadium Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
High Purity Vanadium Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
High Purity Vanadium Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
High Purity Vanadium Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity vanadium sputtering target refers to the high purity vanadium sputtering target with purity over 99%. We mainly provide 2N5 (99.5%) and 3N (99.9%) vanadium sputtering targets.

High Purity Vanadium Sputtering Target Application

High purity vanadium sputtering targets can be used in hydrogen storage alloy and hydrogen separation membrane, high temperature superconductor material and high-speed value-added reactor fuel rod protection material and heat release element.