Indium Oxide Sputtering Target

Indium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Indium Oxide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Indium Oxide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Indium Oxide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Indium Oxide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Indium Oxide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Indium Oxide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Indium Oxide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Indium oxide is an amorphous powder with white or light yellow in appearance. The chemical formula is In2O3. The density is 7.179 g / cm3 and the melting point is 2000 ℃. Indium oxide is insoluble in water and soluble in hot inorganic acids.

Indium oxide sputtering target is a kind of high purity indium oxide raw material by sputtering deposition. According to the different shapes, indium oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) indium oxide targets. It has wide band gap, small resistivity and high catalytic activity. Indium oxide sputtering target can be used as protective coating of metal mirror, semiconductor film of photoelectric display, indium salt, glass and electronic components.

Indium Oxide Sputtering Target Application

High purity indium oxide sputtering target can be used in many applications. The details are as follows:
- Transparent conductive flim
- As protective coating of metal mirror
- Glass and electronic components
- Battery
- ITO powder
- Flat Panel Displays
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.