Iron Oxide Sputtering Target

Iron Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Iron Oxide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Iron Oxide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Iron Oxide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Iron Oxide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Iron Oxide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Iron Oxide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Iron Oxide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Iron oxide is a kind of amorphous powder with red or dark red in appearance. The chemical formula is Fe2O3. The melting point is 1565 ℃. Iron oxide is insoluble in water, soluble in hydrochloric acid and sulfuric acid, slightly soluble in nitric acid.

Iron oxide sputtering target is a kind of iron oxide raw material by sputtering deposition. According to the different shapes, iron oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) iron oxide targets. Iron oxide can be used in magnetic materials, polishing and grinding materials, coatings and ink industry.

Iron Oxide Sputtering Target Application

High purity iron oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS.