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Magnesium Silicide Sputtering Target

Magnesium Silicide Sputtering Target

AvailableMagnesium Silicide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Mg2Si
  • Purity: 99.5% - 99.9%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • Magnesium Silicide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    Magnesium Silicide Sputtering Target Circular 99.5% - 99.9% 0 - 48 ≥ 1
    Magnesium Silicide Sputtering Target Rectangular 99.5% - 99.9% 0 - 48 ≥ 1
    Magnesium Silicide Sputtering Target Annular 99.5% - 99.9% 0 - 48 ≥ 1
    Magnesium Silicide Sputtering Target Oval 99.5% - 99.9% 0 - 48 ≥ 1
    Magnesium Silicide Sputtering Target Cylindrical 99.5% - 99.9% 0 - 48 ≥ 1
    Magnesium Silicide Sputtering Target Planar 99.5% - 99.9% 0 - 48 ≥ 1
    Magnesium Silicide Sputtering Target Rotatable (rotary) 99.5% - 99.9% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    Magnesium silicide is an inorganic compound with cyan or light purple appearance. The chemical formula is Mg2Si and the molecular weight is 76.71. The melting point is 1102 ℃ and the relative density is 1.94. Magnesium silicide is insoluble in cold water and decomposes in hot water. When magnesium silicide is heated to 1200 ℃ in vacuum or hydrogen flow, it can be completely decomposed into elemental matter. It is stable to lye. It decomposes in acid and produces silane and hydrogen.

    Magnesium silicide sputtering target is a kind of high purity magnesium silicide raw material by sputtering deposition. According to the different shapes, magnesium silicide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) magnesium silicide targets. Magnesium silicide is a narrow band gap n-type semiconductor material with high melting point, high hardness and high elastic modulus. It is widely used in optoelectronic devices, energy devices, lasers, semiconductor manufacturing, constant temperature control communication and other fields.

    Magnesium Silicide Sputtering Target Application

    Magnesium silicide sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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