Niobium Carbide Sputtering Target

Niobium Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Niobium Carbide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Niobium Carbide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Niobium Carbide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Niobium Carbide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Niobium Carbide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Niobium Carbide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Niobium Carbide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Niobium carbide is a kind of green carbide in appearance. The chemical formula is NbC. The relative density is 8.47 and the melting point is 3608 ℃. The elastic modulus is 338000 N / mm2, the coefficient of thermal expansion is 6.65 × 10 ^ (- 6) / K, and the thermal conductivity is 14 w / (m · K). Niobium carbide is insoluble in hot and cold hydrochloric acid, sulfuric acid and nitric acid, but soluble in hot mixed solution of hydrofluoric acid and nitric acid.

Niobium carbide sputtering target is a kind of high purity niobium carbide raw material by sputtering deposition. According to the different shapes, niobium carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) niobium carbide targets. Niobium carbide can be used as additive of carbide cemented carbide and purple artificial gem.

Niobium Carbide Sputtering Target Application

Niobium carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.