Niobium Oxide Sputtering Target

Niobium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Niobium Oxide Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
Niobium Oxide Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
Niobium Oxide Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
Niobium Oxide Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
Niobium Oxide Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
Niobium Oxide Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
Niobium Oxide Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

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Niobium oxide, commonly referred to as Nb2O5, is an white oxide powder in appearance. The relative density is 4.47g/cm3. The melting point is 1485 ℃± 5 ℃. Niobium oxide is insoluble in water, insoluble in acid, and soluble in molten potassium bisulfate or carbonate and hydroxide of alkali metal.

Niobium oxide sputtering target is a kind of niobium oxide raw material by sputtering deposition. According to the different shapes, niobium oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) niobium oxide targets. Niobium oxide can be used to make special optical glass, high frequency and low frequency capacitors and piezoelectric ceramic components. It can also be used to produce various niobium alloys for ferroniobium and special steel. It is not only a raw material for the preparation of niobium and its compounds. It can also be used as catalyst and refractory.

Niobium Oxide Sputtering Target Application

High purity niobium oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.