Planar Nickel Sputtering Target

Planar Nickel Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Planar Nickel Sputtering Target	99.9%	0 - 48	≥ 1
Planar Nickel Sputtering Target	99.95%	0 - 48	≥ 1
Planar Nickel Sputtering Target	99.99%	0 - 48	≥ 1
Planar Nickel Sputtering Target	99.995%	0 - 48	≥ 1
Planar Nickel Sputtering Target	99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Planar nickel sputtering target refers to a flat nickel target. Generally, it refers to large-sized flat nickel target.

Planar Nickel Sputtering Target Application

Planar nickel sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Microelectronics industry;
- Optical applications.