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Silicon Carbide Sputtering Target

Silicon Carbide Sputtering Target

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  • Symbol: SiC
  • Purity: 99.9% - 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • Silicon Carbide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    Silicon Carbide Sputtering Target Circular 99.9% - 99.99% 0 - 48 ≥ 1
    Silicon Carbide Sputtering Target Rectangular 99.9% - 99.99% 0 - 48 ≥ 1
    Silicon Carbide Sputtering Target Annular 99.9% - 99.99% 0 - 48 ≥ 1
    Silicon Carbide Sputtering Target Oval 99.9% - 99.99% 0 - 48 ≥ 1
    Silicon Carbide Sputtering Target Cylindrical 99.9% - 99.99% 0 - 48 ≥ 1
    Silicon Carbide Sputtering Target Planar 99.9% - 99.99% 0 - 48 ≥ 1
    Silicon Carbide Sputtering Target Rotatable (rotary) 99.9% - 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    Silicon carbide is a kind of carbide with yellow to green appearance and blue to black in appearance. The chemical formula is SiC. The density is 3.2 g / cm3. The molecular weight is 40.1. The melting point is 2700 ° C. There are two basic varieties of silicon carbide, black silicon carbide and green silicon carbide, which belong to α - SiC. Black silicon carbide contains about 95% SiC, and its toughness is higher than that of green silicon carbide. It is mostly used for processing materials with low tensile strength, such as glass, ceramics, stone, refractories, cast iron and non-ferrous metals. Green silicon carbide contains more than 97% SiC and has good self sharpening property. It is mostly used for machining cemented carbide, titanium alloy and optical glass. It is also used for honing cylinder liner and finishing high speed steel tools.

    Silicon carbide sputtering target is a kind of high purity silicon carbide raw material by sputtering deposition. According to the different shapes, silicon carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) silicon carbide targets. Silicon carbide can be used in semiconductor, lightning rod, circuit element, high temperature application, UV detector, structural material, astronomy, disc brake, clutch, diesel particulate filter, filament pyrometer, ceramic film, cutting tool, heating element, nuclear fuel, jewelry, steel, protector, catalyst carrier and other fields.

    Silicon Carbide Sputtering Target Application

    Silicon carbide sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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