Silicon Dioxide Sputtering Target

Silicon Dioxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Silicon Dioxide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Silicon Dioxide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Silicon Dioxide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Silicon Dioxide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Silicon Dioxide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Silicon Dioxide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Silicon Dioxide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Silicon dioxide is a hard, brittle, insoluble colorless transparent solid. The chemical formula is SiO2, the density is 2.2 g / cm3, the melting point is 1723 ℃, the boiling point is 2230 ℃, and the refractive index is 1.6. Silicon dioxide is insoluble in water. Except for fluorine gas and hydrofluoric acid, silicon dioxide does not react with halogen, hydrogen halide and inorganic acid, but can be dissolved in hot concentrated alkali, molten strong alkali or sodium carbonate.

Silicon dioxide sputtering target is a kind of high purity silicon dioxide raw material by sputtering deposition. According to the different shapes, silicon dioxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) silicon dioxide targets. It can be used in the preparation of optical glass, optical instruments and semiconductor materials.

Silicon Dioxide Sputtering Target Application

High purity silicon dioxide sputtering targets can be used for manufacturing glass, quartz glass, water glass, optical fiber, electronic industry, optical instruments, crafts and refractories, and is an important material for scientific research.