Tin Oxide Sputtering Target

Tin Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tin Oxide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Tin Oxide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Tin Oxide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Tin Oxide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Tin Oxide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Tin Oxide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Tin Oxide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Tin oxide is a kind of powder with white, light yellow or light gray in appearance. The chemical formula is SnO2. The melting point is 1630 ℃ and the boiling point is 1800 ℃. The density is 6.95 g / ml at 25 ° C. Tin oxide is an excellent transparent conductive material.

Tin oxide sputtering target is a kind of high purity tin oxide raw material by sputtering deposition. According to the different shapes, tin oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tin oxide targets. Tin oxide can be used in enamel and electromagnetic materials, as well as in opal glass, tin salt, porcelain colorant, mordant and weight increasing agent for fabric, polishing agent for steel and glass, etc.

Tin Oxide Sputtering Target Application

High purity tin oxide sputtering target can be used in many applications. The details are as follows:
- Normal temperature low resistance;
- High conductivity;
- High Density electrode materials;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.