Titanium Diboride Sputtering Target

Titanium Diboride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Diboride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Diboride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Diboride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Diboride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Titanium Diboride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Titanium Diboride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Titanium Diboride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Titanium diboride is a kind of boride with gray or gray black appearance. The chemical formula is TiB2. The melting point is 3230 ° C. The density is 4.52g/cm3. Titanium diboride has a hexagonal (AlB2) crystal structure with high hardness. Titanium diboride is stable in HCl and HF acid.

Titanium diboride sputtering target is a kind of high purity titanium diboride raw material by sputtering deposition. According to the different shapes, titanium diboride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) titanium diboride targets. Titanium diboride can be used as conductive ceramic material, ceramic cutting tool and mold, composite ceramic material, cathode coating material of aluminum reduction cell, PTC heating ceramic material and flexible PTC material.

Titanium Diboride Sputtering Target Application

Titanium diboride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.