Tungsten Carbide Sputtering Target

Tungsten Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tungsten Carbide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Carbide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Carbide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Carbide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Carbide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Carbide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Carbide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Tungsten carbide is a kind of hexagonal crystal carbide with black appearance. The molecular formula is WC and the molecular weight is 195.85. Tungsten carbide is a good conductor of electricity and heat because of its metallic luster and similar hardness to diamond. Tungsten carbide is insoluble in water, hydrochloric acid and sulfuric acid, but easily soluble in the mixed acid of nitric acid and hydrofluoric acid.

Tungsten carbide sputtering target is a kind of high purity tungsten carbide raw material by sputtering deposition. According to the different shapes, tungsten carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tungsten carbide targets. Tungsten carbide can be used in high speed cutting tools, furnace structural materials, jet engine parts, cermet materials, resistance heating elements and other occasions.

Tungsten Carbide Sputtering Target Application

Tungsten carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.