Aluminum Sputtering Target (Al)

Aluminum Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Aluminum Sputtering Target	Circular	99.99% - 99.9995%	0 - 48	≥ 1
Aluminum Sputtering Target	Rectangular	99.99% - 99.9995%	0 - 48	≥ 1
Aluminum Sputtering Target	Annular	99.99% - 99.9995%	0 - 48	≥ 1
Aluminum Sputtering Target	Oval	99.99% - 99.9995%	0 - 48	≥ 1
Aluminum Sputtering Target	Cylindrical	99.99% - 99.9995%	0 - 48	≥ 1
Aluminum Sputtering Target	Planar	99.99% - 99.9995%	0 - 48	≥ 1
Aluminum Sputtering Target	Rotatable (rotary)	99.99% - 99.9995%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Aluminum is a kind of silver white light metal with ductility. Aluminum is often made into rod, sheet, foil, powder, ribbon and wire. It can form an oxide film to prevent metal corrosion in humid air. Aluminum is easily soluble in dilute sulfuric acid, nitric acid, hydrochloric acid, sodium hydroxide and potassium hydroxide solutions, but not in water. The relative density of aluminum is 2.70. The melting point is 660 ℃. The boiling point is 2327 ℃.

According to the different shapes, aluminum sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) aluminum targets.

Aluminum Sputtering Target Application

High purity aluminum sputtering target has excellent conductivity and particle minimization film. 3N5-4N5 aluminum sputtering target is mostly used for rolling aluminum foil of electrolytic capacitor, lighting and data storage. 5N-6N ultrapure aluminum sputtering targets are mostly used in semiconductor devices, optoelectronic storage media, superconducting cable stabilizing materials and space shuttle scientific research.