CIGS Sputtering Target

CIGS Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
CIGS Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
CIGS Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
CIGS Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
CIGS Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
CIGS Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
CIGS Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
CIGS Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Copper indium gallium selenide (CIGS) is an I-III-VI2 semiconductor material composed of copper, indium, gallium, and selenium. The material is a solid solution of copper indium selenide and copper gallium selenide (often abbreviated "CIS"). It has a chemical formula of CuInxGa(1-x)Se2, where the value of x can vary from 1 (pure copper indium selenide) to 0 (pure copper gallium selenide). 

CIGS sputtering target is a kind of high purity CIGS raw material by sputtering deposition. According to the different shapes, CIGS sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) CIGS targets. 

CIGS Sputtering Target Application

High purity CIGS sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.