High Purity AZO Sputtering Target

High Purity AZO Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity AZO Sputtering Target	Circular	99.99%	0 - 48	≥ 1
High Purity AZO Sputtering Target	Rectangular	99.99%	0 - 48	≥ 1
High Purity AZO Sputtering Target	Annular	99.99%	0 - 48	≥ 1
High Purity AZO Sputtering Target	Oval	99.99%	0 - 48	≥ 1
High Purity AZO Sputtering Target	Cylindrical	99.99%	0 - 48	≥ 1
High Purity AZO Sputtering Target	Planar	99.99%	0 - 48	≥ 1
High Purity AZO Sputtering Target	Rotatable (rotary)	99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity AZO sputtering target refers to the high purity AZO sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity AZO sputtering targets.

High Purity AZO Sputtering Target Application

High purity AZO sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Low-E Glass Industry (Architectural glass, Automotive glass);
- Thin Film Photovoltaic Industry (TCO);
- Flat Panel Displays.