IZO Sputtering Target (In2O3/ZnO 90/10 wt %)

IZO Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
IZO Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
IZO Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
IZO Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
IZO Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
IZO Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
IZO Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
IZO Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Indium zinc oxide (IZO, In2O3/ZnO 90/10 wt %) is a oxide of In2O3 and ZnO in varying proportions. 

IZO sputtering target is a kind of indium zinc oxide raw material by sputtering deposition. According to the different shapes, IZO sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) IZO targets. IZO sputtering target can be used to make transparent conductive coatings which will be used for plane indicator such as LCD, ELD, and ECD.

IZO Sputtering Target Application

High purity IZO sputtering target can be used in many occasions. The details are as follows:
- Transparent conductive film;
- Physical vapor deposition;
- Chemical vapor deposition.