High Purity ITO Sputtering Target

High Purity ITO Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity ITO Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
High Purity ITO Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
High Purity ITO Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
High Purity ITO Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
High Purity ITO Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
High Purity ITO Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
High Purity ITO Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity ITO sputtering target refers to the high purity ITO sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity ITO sputtering target.

High Purity ITO Sputtering Target Application

High purity ITO sputtering target can be used in many applications. The details are as follows:
- FPD, Touch panel, Solar cells, LED;
- Semicoductor;
- Special glass, Freezer glass;
- Precision optics.