High Purity Silicon Monoxide Sputtering Target

High Purity Silicon Monoxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Silicon Monoxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Silicon Monoxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Silicon Monoxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Silicon Monoxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
High Purity Silicon Monoxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
High Purity Silicon Monoxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
High Purity Silicon Monoxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity silicon monoxide sputtering target refers to the high purity silicon monoxide sputtering target with purity over 99%. We mainly provide 3N (99.9%) high-purity silicon monoxide sputtering targets.

High Purity Silicon Monoxide Sputtering Target Application

High purity silicon monoxide sputtering targets can be used as fine ceramic synthetic material, and used as the preparation of optical glass and semiconductor materials; silicon monoxide can also evaporate in vacuum and be coated on the metal reflection mirror used for optical instruments as protective film; silicon monoxide can also be used for the preparation of semiconductor materials.