High Purity Tantalum Sputtering Target

High Purity Tantalum Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Tantalum Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Tantalum Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Tantalum Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Tantalum Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
High Purity Tantalum Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
High Purity Tantalum Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
High Purity Tantalum Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity tantalum sputtering target refers to the high purity tantalum sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) tantalum sputtering targets and 4N (99.99%) tantalum sputtering targets.

High Purity Tantalum Sputtering Target Application

The high purity tantalum sputtering target produced by FUSHEL can obtain thin films with excellent conductivity and particle minimization in the process of physical vapor deposition.It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Used in semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.