Planar Tantalum Sputtering Target

Planar Tantalum Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Planar Tantalum Sputtering Target	99.95%	0 - 48	≥ 1
Planar Tantalum Sputtering Target	99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

The planar tantalum sputtering target is a tantalum target in the form of a flat plate. Generally, it refers to large size planar tantalum target.

Planar Tantalum Sputtering Target Application

Planar tantalum sputtering target is a kind of high purity tantalum raw material for sputtered deposition. The high purity tantalum sputtering target produced by us can obtain thin films with excellent conductivity and particle minimization in the process of physical vapor deposition.It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Used in semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.