Vanadium Carbide Sputtering Target

Vanadium Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Vanadium Carbide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Vanadium Carbide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Vanadium Carbide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Vanadium Carbide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Vanadium Carbide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Vanadium Carbide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Vanadium Carbide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Vanadium carbide is a kind of cubic crystal with black appearance. The chemical formula is VC. The melting point is 2810 ℃, the boiling point is 3900 ℃, and the relative density is 5.77. Vanadium carbide can be prepared by reduction of vanadium pentoxide with coke.

Vanadium carbide sputtering target is a kind of high purity vanadium carbide raw material by sputtering deposition. According to the different shapes, vanadium carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) vanadium carbide targets. Vanadium carbide can be used as additive for carbide cemented carbide.

Vanadium Carbide Sputtering Target Application

Vanadium carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.